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A chrome mask writer, with capability down to 0.8 micron writing resolution.
A spinner system for photoresist spin-coating processes. A versatile solvent wet bench for cleaning, etching, lift-off process and photoresist development.
A 5 motor-stage field emission SEM, with resolution down to 2nm. Two profilometers for step-height and profile inspection.
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Last modified: 01.11.2008